Invention Grant
- Patent Title: Substrate state determining apparatus, substrate processing apparatus, model generating apparatus, and substrate state determining method
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Application No.: US16549365Application Date: 2019-08-23
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Publication No.: US11598007B2Publication Date: 2023-03-07
- Inventor: Nao Akashi , Yuta Haga , Hiroyuki Sato , Motoi Okada , Kei Sano , Junya Sato , Takayuki Kita , Atsushi Suzuki , Kiwamu Tsukino , Takuro Tsutsui
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JPJP2018-167226 20180906
- Main IPC: G06K9/00
- IPC: G06K9/00 ; C23C16/52 ; C23C16/458 ; C23C16/46 ; G06T7/73 ; G06N3/08 ; G06T7/00 ; H04N5/247

Abstract:
According to an aspect of the present disclosure, a substrate state determining apparatus includes: an image capturing unit that captures an image of a substrate placed on a stage; a learning unit that executes a machine learning using training data in which information indicating a state of the substrate is attached to the image of the substrate, so as to generate a substrate state determination model in which the image of the substrate is taken as an input and a value related to the state of the substrate corresponding to the image of the substrate is taken as an output; and a determination unit that determines the state of the substrate corresponding to the image of the substrate captured by the image capturing unit, using the substrate state determination model generated by the learning unit.
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