Invention Grant
- Patent Title: CVD apparatus
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Application No.: US15764276Application Date: 2016-09-29
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Publication No.: US11598021B2Publication Date: 2023-03-07
- Inventor: Shawn George Thomas , Gang Wang
- Applicant: GlobalWafers Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: GlobalWafers Co., Ltd.
- Current Assignee: GlobalWafers Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Armstrong Teasdale LLP
- International Application: PCT/US2016/054507 WO 20160929
- International Announcement: WO2017/059114 WO 20170406
- Main IPC: C30B25/12
- IPC: C30B25/12 ; C23C16/458 ; C30B25/10 ; H01L21/687 ; H01L21/67
Abstract:
A preheat ring (126) for use in a chemical vapor deposition system includes a first portion and a second portion selectively coupled to the first portion such that the first and second portions combine to form an opening configured to receive a susceptor therein. Each of the first and second portions is independently moveable with respect to each other.
Public/Granted literature
- US20180282865A1 CVD APPARATUS Public/Granted day:2018-10-04
Information query
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