- Patent Title: IR drop analysis based on sensitivity analysis and visualization
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Application No.: US16935309Application Date: 2020-07-22
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Publication No.: US11599698B1Publication Date: 2023-03-07
- Inventor: Maxim Ershov
- Applicant: Diakopto, Inc.
- Applicant Address: US CA San Jose
- Assignee: Diakopto, Inc.
- Current Assignee: Diakopto, Inc.
- Current Assignee Address: US CA San Jose
- Agent Marc P. Schuyler
- Main IPC: G06F30/30
- IPC: G06F30/30 ; G06F30/398 ; G06F111/20 ; G06F111/04

Abstract:
A computer/software tool for electronic design automation (EDA) extracts parasitics from a post-layout netlist file for an integrated circuit (IC) design and uses these parasitics to model circuit behavior between one or more excitation points and one or more observation points for a given circuit design characteristic. Sensitivities of that given circuit design characteristic to each constituent parasitic (or a group of parasitics that might be, for example, associated with a given structural element such as a layer) are then computed. The computer/software tool generates a visual display based on the relative sensitivities; for example, in one embodiment, relative sensitivities can be color-coded to permit a designer to visualize sources of problems in the IC design. In other embodiments, the sensitivities can be filtered and/or processed, e.g., so as to provide EDA driven assistance to changes to reduce excessive sensitivities or sensitivities to certain parasitics.
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