Invention Grant
- Patent Title: Method and system to detect substrate placement accuracy
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Application No.: US17176515Application Date: 2021-02-16
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Publication No.: US11600016B2Publication Date: 2023-03-07
- Inventor: Anindya Sarkar , Chibuya Siame
- Applicant: Ventana Medical Systems, Inc.
- Applicant Address: US AZ Tucson
- Assignee: Ventana Medical Systems, Inc.
- Current Assignee: Ventana Medical Systems, Inc.
- Current Assignee Address: US AZ Tucson
- Agency: Charney IP Law LLC
- Agent Thomas M. Finetti
- Main IPC: G06T7/73
- IPC: G06T7/73 ; G06T7/13 ; G02B21/26 ; G02B21/34 ; G02B21/36
Abstract:
A method and system for measuring the alignment between a substrate and a platform upon which it is disposed by using image processing algorithms are described herein. These algorithms automate the detection of edges of a microscope slide and the platform in a digital image. A reference line pattern in an image of the platform can be used to detect platform edges based on a computed location of the reference line pattern in the image.
Public/Granted literature
- US20210166420A1 METHOD AND SYSTEM TO DETECT SUBSTRATE PLACEMENT ACCURACY Public/Granted day:2021-06-03
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