- Patent Title: Thermistor with protective film and manufacturing method thereof
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Application No.: US17267818Application Date: 2019-08-21
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Publication No.: US11600410B2Publication Date: 2023-03-07
- Inventor: Takehiro Yonezawa , Miki Adachi
- Applicant: MITSUBISHI MATERIALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
- Priority: JPJP2018-156647 20180823,JPJP2019-143817 20190805,JPJP2019-143890 20190805
- International Application: PCT/JP2019/032636 WO 20190821
- International Announcement: WO2020/040197 WO 20200227
- Main IPC: H01C7/00
- IPC: H01C7/00 ; H01C17/28 ; H01C1/14 ; H01C1/142 ; H01C17/065
Abstract:
A thermistor has a thermistor element, a protective film, and an electrode portion. The protective film is formed of a SiO2 film having a film thickness in a range of 50 nm or more and 1000 nm or less. The protective film is formed in contact with the thermistor element. Alkali metal is unevenly distributed in a region including an interface between the thermistor element and the protective film.
Public/Granted literature
- US20210166846A1 THERMISTOR WITH PROTECTIVE FILM AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-06-03
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