Invention Grant
- Patent Title: Integrated assemblies having conductive material along three of four sides around active regions, and methods of forming integrated assemblies
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Application No.: US16868133Application Date: 2020-05-06
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Publication No.: US11600535B2Publication Date: 2023-03-07
- Inventor: Litao Yang , Srinivas Pulugurtha , Yunfei Gao , Sanh D. Tang , Haitao Liu
- Applicant: Micron Technology, inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, inc.
- Current Assignee: Micron Technology, inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L21/84 ; H01L21/265 ; H01L29/78 ; H01L27/108

Abstract:
Some embodiments include an integrated assembly having an array of vertically-extending active regions. Each of the active regions is contained within a four-sided area. Conductive gate material is configured as first conductive structures. Each of the first conductive structures extends along a row of the array. The first conductive structures include segments along three of the four sides of each of the four-sided areas. Second conductive structures are under the active regions and extend along columns of the array. Third conductive structures extend along the rows of the array and are adjacent the fourth sides of the four-sided areas. Storage-elements are coupled with the active regions. Some embodiments include methods of forming integrated assemblies.
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Information query
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