- Patent Title: Power semiconductor apparatus and method for manufacturing the same
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Application No.: US17621249Application Date: 2019-08-29
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Publication No.: US11600546B2Publication Date: 2023-03-07
- Inventor: Hiroyuki Yoshihara , Shunji Masumori , Kenichi Hayashi , Masaki Goto
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Xsensus LLP
- International Application: PCT/JP2019/033921 WO 20190829
- International Announcement: WO2021/038796 WO 20210304
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L21/48 ; H05K7/20 ; H01L23/10 ; H01L23/40 ; H01L23/495

Abstract:
A power semiconductor apparatus includes a mold portion, a panel that is conductive and in a flat plate shape, and a plurality of fins. The mold portion includes a power semiconductor element and a base plate that are molded. An opening is formed in the panel into which the base plate is inserted. The plurality of fins is fixed in grooves of the base plate. The panel has a plurality of protrusions on side surfaces forming the opening. Each protrusion has a fifth surface a cross section of which has a shape that tapers down toward an end of the protrusion, the cross section being parallel to a plane extending in the Z direction and a direction in which the protrusion protrudes. The base plate has cover portions covering the fifth surfaces, and is plastically deformed to allow the panel to be fitted in the base plate to fill gaps.
Public/Granted literature
- US20220352049A1 POWER SEMICONDUCTOR APPARATUS AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2022-11-03
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