Invention Grant
- Patent Title: Memory and method for forming the same
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Application No.: US16909619Application Date: 2020-06-23
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Publication No.: US11600627B2Publication Date: 2023-03-07
- Inventor: Tao Yu
- Applicant: Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Applicant Address: CN Shanghai
- Assignee: Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Current Assignee: Shanghai Huahong Grace Semiconductor Manufacturing Corporation
- Current Assignee Address: CN Shanghai
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: CN202010192701 20200318
- Main IPC: H01L27/11517
- IPC: H01L27/11517 ; H01L29/66 ; H01L29/423 ; G11C5/02 ; H01L29/788

Abstract:
The present disclosure provides a memory and a method for forming the memory. The memory includes: a substrate including a first storage area and a second storage area; a source region disposed in the substrate between the first storage area and the second storage area; a first drain region and a second drain region in the substrate on both sides of the first storage area and the second storage area; a first storage structure disposed on the first storage area, including a first storage unit, a second storage unit, and a first word line gate; and a second storage structure disposed on the second storage area, including a third storage unit, a fourth storage unit, and a second word line gate. The memory can obtain an improved performance.
Public/Granted literature
- US20210296330A1 Memory and Method for Forming the Same Public/Granted day:2021-09-23
Information query
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