Invention Grant
- Patent Title: Electrode assemblies for plasma discharge devices
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Application No.: US17414036Application Date: 2019-12-20
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Publication No.: US11602039B2Publication Date: 2023-03-07
- Inventor: Yves Gamache , André Lamontagne
- Applicant: MÉCANIQUE ANALYTIQUE INC.
- Applicant Address: CA Thetford Mines
- Assignee: MÉCANIQUE ANALYTIQUE INC.
- Current Assignee: MÉCANIQUE ANALYTIQUE INC.
- Current Assignee Address: CA Thetford Mines
- Agency: FisherBroyles, LLP
- Agent Craig W. Mueller
- International Application: PCT/CA2019/051888 WO 20191220
- International Announcement: WO2020/124264 WO 20200625
- Main IPC: H05H1/24
- IPC: H05H1/24

Abstract:
There is provided a compound electrode assembly for generating a plasma in a plasma chamber of a plasma discharge device. The compound electrode assembly includes a casing, a discharge electrode and a sealing compound. The casing is made of a dielectric material and includes at least one side wall and an end wall defining a closed end. The discharge electrode is mounted in the casing and is bonded to the end wall. The sealing compound surrounds the discharge electrode and extends within the casing.
Public/Granted literature
- US20220030693A1 ELECTRODE ASSEMBLIES FOR PLASMA DISCHARGE DEVICES Public/Granted day:2022-01-27
Information query
IPC分类: