Invention Grant
- Patent Title: Device for measuring bump height, apparatus for processing substrate, method of measuring bump height, and storage medium
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Application No.: US17256921Application Date: 2019-06-27
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Publication No.: US11604150B2Publication Date: 2023-03-14
- Inventor: Takahisa Okuzono , Masaki Tomita , Jumpei Fujikata , Hideki Takayanagi
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: BakerHostetler
- Priority: JPJP2018-125427 20180629
- International Application: PCT/JP2019/025576 WO 20190627
- International Announcement: WO2020/004544 WO 20200102
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01B11/06 ; G01N21/45 ; H01L23/00

Abstract:
An object is to allow for simple measurement of a bump height. There is provided a device for measuring a bump height comprising: a light sensor provided with a light source and a light-receiving element and configured to irradiate a substrate including a seed layer, a resist layer formed on the seed layer and a bump formed in an opening of the resist layer, with light emitted from the light source and to detect reflected light that is reflected from the seed layer via the resist layer and reflected light that is reflected from the bump, by the light-receiving element; and a control device configured to calculate a height of the bump relative to the seed layer, based on the reflected light from the seed layer and the reflected light from the bump and to subtract an error caused by a refractive index of the resist layer from the height of the bump calculated based on the reflected lights, so as to correct the height of the bump.
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