Invention Grant
- Patent Title: Method of manufacturing semiconductor package
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Application No.: US17520526Application Date: 2021-11-05
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Publication No.: US11605612B2Publication Date: 2023-03-14
- Inventor: Shing-Yih Shih
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agent Xuan Zhang
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L23/538 ; H01L23/31 ; H01L25/00 ; H01L21/48 ; H01L21/56 ; H01L23/498

Abstract:
The present disclosure provides a method of manufacturing a semiconductor package assembly. The method includes steps of providing a plurality of first dies arranged horizontally; forming a redistribution layer on the first dies and the first insulative material, wherein the redistribution layer is divided into a first segment and a second segment electrically isolated from the first segment; mounting a plurality of second dies on the first segment of the redistribution layer; depositing a second insulative layer on the second dies and the redistribution layer; and forming a plurality of conductive plugs penetrating through the second insulative material and contacting the second segment of the redistribution layer.
Public/Granted literature
- US20220059497A1 METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE Public/Granted day:2022-02-24
Information query
IPC分类: