Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17198309Application Date: 2021-03-11
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Publication No.: US11605613B2Publication Date: 2023-03-14
- Inventor: Tomohiro Iguchi
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo; JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: Allen & Overy LLP
- Priority: JPJP2020-082417 20200508
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L23/00 ; H01L23/498 ; H01L23/538 ; H01L27/07

Abstract:
According to an embodiment, provided is a semiconductor device includes an insulating substrate; a first main terminal; a second main terminal; an output terminal; a first metal layer connected to the first main terminal; a second metal layer connected to the second main terminal; a third metal layer disposed between the first metal layer and the second metal layer and connected to the output terminal; a first semiconductor chip and a second semiconductor chip provided on the first metal layer; and a third semiconductor chip and a fourth semiconductor chip provided on the third metal layer. The second metal layer includes a first slit. Alternatively, the third metal layer includes a second slit.
Public/Granted literature
- US20210351161A1 SEMICONDUCTOR DEVICE Public/Granted day:2021-11-11
Information query
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