Invention Grant
- Patent Title: Silicon carbide planar MOSFET with wave-shaped channel regions
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Application No.: US17155504Application Date: 2021-01-22
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Publication No.: US11605713B2Publication Date: 2023-03-14
- Inventor: Rahul R. Potera , Vipindas Pala , Tony Witt
- Applicant: SemiQ Incorporated
- Applicant Address: US CA Lake Forest
- Assignee: SemiQ Incorporated
- Current Assignee: SemiQ Incorporated
- Current Assignee Address: US CA Lake Forest
- Agency: The Law Offices of Bradley J. Bereznak
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/10 ; H01L29/16

Abstract:
A silicon carbide MOSFET includes first and second source regions respectively disposed in the first and second well regions. Each of the first and second source regions extends up to a top surface of the substrate. First and second channel regions of the respective first and second well regions laterally separate the first and second source regions from a JFET region by a channel length. The first and second channel regions extend up to the top surface. The first and second channel regions are each arranged in a wave-shaped pattern at the top surface of the substrate. The wave-shaped pattern extends in first and second lateral directions. In an on-state, current flows laterally from the first and second source regions to the JFET region, and then in a vertical direction down through an extended drain region to the drain region.
Public/Granted literature
- US20210143256A1 Silicon Carbide Planar MOSFET With Wave-Shaped Channel Regions Public/Granted day:2021-05-13
Information query
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