Invention Grant
- Patent Title: Air-gap type film bulk acoustic resonator
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Application No.: US16990050Application Date: 2020-08-11
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Publication No.: US11606076B2Publication Date: 2023-03-14
- Inventor: Byung Hun Kim , Jong Hyeon Park , Yong Hun Ko , Hyoung Woo Kim
- Applicant: WISOL CO., LTD.
- Applicant Address: KR Gyeonggi-do
- Assignee: WISOL CO., LTD.
- Current Assignee: WISOL CO., LTD.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0101222 20190819
- Main IPC: H03H9/02
- IPC: H03H9/02 ; H03H9/17

Abstract:
Disclosed is an air-gap type film bulk acoustic resonator (FBAR) including a substrate including an air-gap portion with a top surface in which a substrate cavity is formed, a lower electrode formed above the substrate while surrounding the air-gap portion, a piezoelectric layer formed above the lower electrode, and an upper electrode formed above the piezoelectric layer corresponding to a virtual area formed according to a vertical projection of the air-gap portion. Here, the piezoelectric layer includes a void portion having a piezoelectric cavity between the lower electrode and the upper electrode, and the void portion is formed below an edge portion corresponding to an end part of the upper electrode.
Public/Granted literature
- US20210058055A1 AIR-GAP TYPE FILM BULK ACOUSTIC RESONATOR Public/Granted day:2021-02-25
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