Invention Grant
- Patent Title: Low-dielectric heat dissipation film composition and low-dielectric heat dissipation film
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Application No.: US16828779Application Date: 2020-03-24
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Publication No.: US11608438B2Publication Date: 2023-03-21
- Inventor: Hiroyuki Iguchi , Yoshinori Takamatsu , Yuki Kudo , Atsushi Tsuura , Yoshihiro Tsutsumi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2019-074644 20190410
- Main IPC: C08L79/08
- IPC: C08L79/08 ; C08G73/12 ; C08K3/38 ; C08J5/18 ; H05K1/02

Abstract:
A low-dielectric heat dissipation film composition contains: (A) a maleimide resin composition containing (A1) a maleimide resin containing at least two or more maleimide groups per molecule and (A2) a polymerization initiator; and (B) boron nitride particles. The component (A1) has a maleimide equivalent of not more than 0.1 mol/100 g, and a cured material of the component (A) has a relative dielectric constant of 3.5 or less at a frequency of 10 GHz. Thus, the present invention provides a film composition for forming a film having low dielectric constant and high heat dissipation.
Public/Granted literature
- US20200325334A1 LOW-DIELECTRIC HEAT DISSIPATION FILM COMPOSITION AND LOW-DIELECTRIC HEAT DISSIPATION FILM Public/Granted day:2020-10-15
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