Formation failure resilient neuromorphic device
Abstract:
A neuromorphic device includes a plurality of first control lines, a plurality of second control lines and a matrix of resistive processing unit cells. Each resistive processing unit cell is electrically connected with one of the first control lines and one of the second control lines. A given resistive processing unit cell includes a first resistive device and a second resistive device. The first resistive device is a positively weighted resistive device and the second resistive device is a negatively weighted resistive device.
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