Invention Grant
- Patent Title: Semiconductor device and manufacturing method of the semiconductor device
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Application No.: US17243270Application Date: 2021-04-28
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Publication No.: US11610915B2Publication Date: 2023-03-21
- Inventor: Sang Yong Lee , Sang Min Kim , Jung Ryul Ahn , Sang Hyun Oh , Seung Bum Cha , Kang Sik Choi
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon-si Gyeonggi-do
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Icheon-si Gyeonggi-do
- Agency: William Park & Associates Ltd.
- Priority: KR10-2018-0027463 20180308
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L25/065 ; H01L27/06 ; H01L27/11556

Abstract:
A semiconductor device includes: a first stack structure; a second stack structure adjacent to the first stack structure in a first direction; a first insulating layer including protrusion parts protruding in a second direction intersecting the first direction and including a concave part defined between the protrusion parts; and a second insulating layer located between the first stack structure and the second stack structure, the second insulating layer inserted into the concave part and the second insulating layer in contact with at least one protrusion part among the protrusion parts.
Public/Granted literature
- US20210249441A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR DEVICE Public/Granted day:2021-08-12
Information query
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