Invention Grant
- Patent Title: Group 13 element nitride layer, free-standing substrate and functional element
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Application No.: US16797685Application Date: 2020-02-21
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Publication No.: US11611017B2Publication Date: 2023-03-21
- Inventor: Takayuki Hirao , Hirokazu Nakanishi , Mikiya Ichimura , Takanao Shimodaira , Masahiro Sakai , Takashi Yoshino
- Applicant: NGK INSULATORS, LTD.
- Applicant Address: JP Nagoya
- Assignee: NGK INSULATORS, LTD.
- Current Assignee: NGK INSULATORS, LTD.
- Current Assignee Address: JP Nagoya
- Agency: Flynn Thiel, P.C.
- Priority: WOPCT/JP2017/030373 20170824,WOPCT/JP2017/034035 20170921,JPJP2018-061580 20180328
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L33/18 ; H01L29/20 ; H01L29/34 ; H01L29/778 ; H01L29/872 ; H01L33/02 ; H01L33/06 ; H01L33/32

Abstract:
A layer of a crystal of a group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof has an upper surface and a bottom surface. The upper surface of a crystal layer of the group 13 nitride includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part, observed by cathode luminescence. The high-luminance light-emitting part includes a portion extending along an m-plane of the crystal of the group 13 nitride. The crystal of the nitride of the group 13 element contains oxygen atoms in a content of 1×1018 atom/cm3 or less, silicon atoms, manganese atoms, carbon atoms, magnesium atoms and calcium atoms in contents of 1×1017 atom/cm3 or less, chromium atoms in a content of 1×1016 atom/cm3 or less and chlorine atoms in a content of 1×1015 atom/cm3 or less.
Information query
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