Invention Grant
- Patent Title: Cleaning method and cleaning apparatus
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Application No.: US17166399Application Date: 2021-02-03
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Publication No.: US11612915B2Publication Date: 2023-03-28
- Inventor: Kiyoshi Suzuki
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: BakerHostetler
- Priority: JPJP2020-029646 20200225
- Main IPC: B08B3/04
- IPC: B08B3/04 ; C25D17/06 ; C25D17/10 ; B08B11/02 ; B08B3/02 ; B08B1/04 ; C25D21/00 ; C11D7/26

Abstract:
There is provided a cleaning method and a cleaning apparatus capable of removing dirt on electrical contacts, the dirt being unable to be removed with deionized water, without adversely affecting a plating solution and a substrate holder which is a member for holding a substrate. A cleaning method according to the present disclosure is a cleaning method for a substrate holder having electrical contacts for supplying electric power to a substrate by contacting the substrate to plate the substrate, the method including a cleaning step of cleaning the electrical contacts attached to the substrate holder with a citric acid aqueous solution.
Public/Granted literature
- US20210260630A1 CLEANING METHOD AND CLEANING APPARATUS Public/Granted day:2021-08-26
Information query
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