Invention Grant
- Patent Title: Vanadium nitride film, and member coated with vanadium nitride film and method for manufacturing the same
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Application No.: US17241385Application Date: 2021-04-27
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Publication No.: US11613463B2Publication Date: 2023-03-28
- Inventor: Satoru Habuka , Hiroyuki Matsuoka , Wataru Sakakibara
- Applicant: DOWA THERMOTECH CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: DOWA THERMOTECH CO., LTD.
- Current Assignee: DOWA THERMOTECH CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JPJP2016-146948 20160727
- Main IPC: C01B21/06
- IPC: C01B21/06 ; B23B27/14 ; C23C16/34 ; C23C16/50 ; C23C16/52 ; C23C16/36 ; C22C38/24 ; C22C38/46 ; C23C14/06 ; C23C16/505
Abstract:
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less.
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