Invention Grant
- Patent Title: Systems and methods for radial and axial stability control of an FRC plasma
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Application No.: US17525437Application Date: 2021-11-12
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Publication No.: US11615896B2Publication Date: 2023-03-28
- Inventor: Jesus Antonio Romero Gonzalez
- Applicant: TAE TECHNOLOGIES, INC.
- Applicant Address: US CA Foothill Ranch
- Assignee: TAE TECHNOLOGIES, INC.
- Current Assignee: TAE TECHNOLOGIES, INC.
- Current Assignee Address: US CA Foothill Ranch
- Agency: One LLP
- Main IPC: G21B1/05
- IPC: G21B1/05 ; H05H1/22 ; H05H1/16 ; H05H1/54 ; G21B1/13 ; H05H1/14 ; G21B1/17 ; G21B1/15

Abstract:
Systems and methods are provided that facilitate stability of an FRC plasma in both radial and axial directions and axial position control of an FRC plasma along the symmetry axis of an FRC plasma chamber. The systems and methods exploit an axially unstable equilibria of the FRC plasma to enforce radial stability, while stabilizing or controlling the axial instability. The systems and methods provide feedback control of the FRC plasma axial position independent of the stability properties of the plasma equilibrium by acting on the voltages applied to a set of external coils concentric with the plasma and using a non-linear control technique.
Public/Granted literature
- US20220068510A1 SYSTEMS AND METHODS FOR FRC PLASMA POSITION STABILITY Public/Granted day:2022-03-03
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