Invention Grant
- Patent Title: Capacitive element and plasma processing device
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Application No.: US16964603Application Date: 2019-01-25
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Publication No.: US11615922B2Publication Date: 2023-03-28
- Inventor: Dongwei Li , Yasunori Ando
- Applicant: NISSIN ELECTRIC CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: NISSIN ELECTRIC CO., LTD.
- Current Assignee: NISSIN ELECTRIC CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: JCIPRNET
- Priority: JPJP2018-010961 20180125
- International Application: PCT/JP2019/002497 WO 20190125
- International Announcement: WO2019/146758 WO 20190801
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01G5/013 ; H01G5/12

Abstract:
A capacitive element using a liquid as a dielectric, whereby the capacitance is prevented from changing. The capacitive element is equipped with: a storage container that has an inlet port for introducing a liquid serving as a dielectric, has an outlet port for discharging the liquid, and is filled with the liquid; and at least one pair of electrodes that are provided in the storage container and face each other, wherein an opening section for exhausting air bubbles in the storage container is formed in an upper wall of the storage container.
Public/Granted literature
- US20210050156A1 CAPACITIVE ELEMENT AND PLASMA PROCESSING DEVICE Public/Granted day:2021-02-18
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