Invention Grant
- Patent Title: Imaging element, manufacturing method of imaging element, metal thin film filter, and electronic device
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Application No.: US17337191Application Date: 2021-06-02
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Publication No.: US11616091B2Publication Date: 2023-03-28
- Inventor: Taro Sugizaki
- Applicant: Sony Semiconductor Solutions Corporation
- Applicant Address: JP Kanagawa
- Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Wolf, Greenfield & Sacks, P.C.
- Priority: JPJP2016-241253 20161213
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
According to some aspects, an imaging device is provided comprising a photoelectric conversion layer configured to receive light and to produce an electric charge in response to the received light, including a first filter region corresponding to a first pixel of the imaging device, the first filter region having a first thickness and a plurality of through holes formed therein, wherein the first filter region transmits light incident on the first filter region with a first peak transmission wavelength, and a second filter region corresponding to a second pixel of the imaging device, the second filter region having a second thickness greater than the first thickness and having a plurality of through holes formed therein, wherein the second filter region transmits light incident on the second filter region with a second peak transmission wavelength that is greater than the first peak transmission wavelength.
Public/Granted literature
- US20210288091A1 IMAGING ELEMENT, MANUFACTURING METHOD OF IMAGING ELEMENT, METAL THIN FILM FILTER, AND ELECTRONIC DEVICE Public/Granted day:2021-09-16
Information query
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