Invention Grant
- Patent Title: Interconnect substrate and method of making the same
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Application No.: US17447977Application Date: 2021-09-17
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Publication No.: US11617264B2Publication Date: 2023-03-28
- Inventor: Yuji Yukiiri
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP Nagano
- Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee Address: JP Nagano
- Agency: IPUSA, PLLC
- Priority: JPJP2020-162183 20200928
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K1/11 ; H05K1/03

Abstract:
An interconnect substrate includes a first insulating layer, an interconnect layer formed on a first surface of the first insulating layer, and a second insulating layer formed on the first surface of the first insulating layer to cover the interconnect layer, wherein the second insulating layer includes a first resin layer and a second resin layer, the first resin layer covering at least part of a surface of the interconnect layer exposed outside the first insulating layer, the second resin layer covering the first resin layer, wherein both the first resin layer and the second resin layer contain a resin and a filler, and wherein a proportion of the resin in the first resin layer per unit area is higher than a proportion of the resin in the second resin layer per unit area.
Public/Granted literature
- US20220104352A1 INTERCONNECT SUBSTRATE AND METHOD OF MAKING THE SAME Public/Granted day:2022-03-31
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