Invention Grant
- Patent Title: Sputtering target, magnetic film, and perpendicular magnetic recording medium
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Application No.: US17266896Application Date: 2019-05-23
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Publication No.: US11618944B2Publication Date: 2023-04-04
- Inventor: Manami Masuda , Masayoshi Shimizu , Yasuyuki Iwabuchi
- Applicant: JX Nippon Mining & Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Marshall, Gerstein & Borun LLP
- Priority: JPJP2018-150675 20180809
- International Application: PCT/JP2019/020556 WO 20190523
- International Announcement: WO2020/031460 WO 20200213
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34 ; C22C19/07 ; G11B5/706 ; H01F1/10 ; H01F41/18 ; G11B5/65 ; C04B35/01 ; C23C14/08 ; C23C14/14 ; C22C32/00 ; C22C1/04
Abstract:
Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
Public/Granted literature
- US20210310114A1 SPUTTERING TARGET, MAGNETIC FILM, AND PERPENDICULAR MAGNETIC RECORDING MEDIUM Public/Granted day:2021-10-07
Information query
