Invention Grant
- Patent Title: Method and apparatus for manufacturing defect-free monocrystalline silicon crystal
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Application No.: US17037060Application Date: 2020-09-29
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Publication No.: US11618971B2Publication Date: 2023-04-04
- Inventor: Keiichi Takanashi , Ippei Shimozaki
- Applicant: SUMCO Corporation
- Applicant Address: JP Tokyo
- Assignee: SUMCO Corporation
- Current Assignee: SUMCO Corporation
- Current Assignee Address: JP Tokyo
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Main IPC: C30B35/00
- IPC: C30B35/00 ; C30B15/20 ; C30B15/10

Abstract:
A crystal puller apparatus comprises a pulling assembly to pull a crystal from a silicon melt at a pull speed; a crucible that contains the silicon melt; a heat shield above a surface of the silicon melt; a lifter to change a gap between the heat shield and the surface of the silicon melt; and one or more computing devices to determine an adjustment to the gap using a Pv-Pi margin, at a given length of the crystal, in response to a change in the pull speed. The computer-implemented method by a computing device comprises determining a pull-speed command signal to control a diameter of the crystal; determining a lifter command signal to control a gap between a heat shield and a surface of a silicon melt from which the crystal is grown; and determining an adjustment to the gap, in response to a different pull-speed, using a Pv-Pi margin.
Public/Granted literature
- US20220098757A1 METHOD AND APPARATUS FOR MANUFACTURING DEFECT-FREE MONOCRYSTALLINE SILICON CRYSTAL Public/Granted day:2022-03-31
Information query
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