Invention Grant
- Patent Title: Scintillator structure and manufacturing method thereof
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Application No.: US17371328Application Date: 2021-07-09
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Publication No.: US11619750B2Publication Date: 2023-04-04
- Inventor: Yousuke Nobumoto , Shinsuke Terazawa , Satoshi Shiota
- Applicant: Hitachi Metals, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi Metals, Ltd.
- Current Assignee: Hitachi Metals, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: McCormick, Paulding & Huber PLLC
- Priority: JPJP2020-164700 20200930,JPJP2020-164701 20200930,JPJP2020-164703 20200930,JPJP2020-195635 20201126,JPJP2020-195636 20201126,JPJP2020-195637 20201126
- Main IPC: G01T1/20
- IPC: G01T1/20 ; C09K11/02 ; C09K11/62
Abstract:
A scintillator structure includes a plurality of cells and a reflector covering the plurality of cells. Here, each of the plurality of cells includes a resin and a phosphor, and the phosphor contains gadolinium oxysulfide. A breaking strength of an interface between each of the plurality of cells and the reflector is 900 gf or more.
Public/Granted literature
- US20220099846A1 SCINTILLATOR STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-03-31
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