- Patent Title: Liquid crystal panel and method for etching liquid crystal panel
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Application No.: US17299811Application Date: 2019-12-10
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Publication No.: US11619840B2Publication Date: 2023-04-04
- Inventor: Woo Hwangbo , Young Il Park , Hae Won Chae , Ji Woong Park
- Applicant: KORTEK CORPORATION
- Applicant Address: KR Incheon
- Assignee: KORTEK CORPORATION
- Current Assignee: KORTEK CORPORATION
- Current Assignee Address: KR Incheon
- Agency: Schmeiser, Olsen & Watts, LLP
- Priority: KR10-2018-0159302 20181211
- International Application: PCT/KR2019/017339 WO 20191210
- International Announcement: WO2020/122537 WO 20200618
- Main IPC: G02F1/1333
- IPC: G02F1/1333 ; G02F1/1339

Abstract:
Provided is a liquid crystal panel and an etching method for a liquid crystal panel. The liquid crystal panel includes: a first substrate; and a second substrate installed spaced apart from the first substrate with a liquid crystal layer interposed therebetween, in which a non-etched region of the first substrate and a non-etched region of the second substrate are positioned to be offset from each other.
Public/Granted literature
- US20220026756A1 LIQUID CRYSTAL PANEL AND METHOD FOR ETCHING LIQUID CRYSTAL PANEL Public/Granted day:2022-01-27
Information query
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