The present application discloses a method for fabricating a semiconductor device with air gaps for reducing capacitive coupling between conductive features. The method includes the following operations: forming a first conductive line including a first protruding portion protruding from one side of the first conductive line, forming a second conductive line including a second protruding portion facing onto the first protruding portion and protruding from one side of the second conductive line, forming a void between the first protruding portion and the second protruding portion, and performing an etch process to expand the void into an air gap.