Invention Grant
- Patent Title: Graphene diffusion barrier
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Application No.: US17171432Application Date: 2021-02-09
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Publication No.: US11621226B2Publication Date: 2023-04-04
- Inventor: Yong Wu , Srinivas Gandikota , Abhijit Basu Mallick , Srinivas D. Nemani
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L21/285 ; H01L21/768 ; H01L21/3205 ; C23C16/455 ; C23C16/26 ; H10B69/00 ; H01L27/115

Abstract:
A graphene barrier layer is disclosed. Some embodiments relate to a graphene barrier layer capable of preventing diffusion from a fill layer into a substrate surface and/or vice versa. Some embodiments relate to a graphene barrier layer that prevents diffusion of fluorine from a tungsten layer into the underlying substrate. Additional embodiments relate to electronic devices which contain a graphene barrier layer.
Public/Granted literature
- US20210167021A1 Graphene Diffusion Barrier Public/Granted day:2021-06-03
Information query
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