Invention Grant
- Patent Title: Nitride semiconductor device
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Application No.: US16763295Application Date: 2018-08-31
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Publication No.: US11621328B2Publication Date: 2023-04-04
- Inventor: Daisuke Shibata , Satoshi Tamura , Nanako Hirashita
- Applicant: Panasonic Corporation
- Applicant Address: JP Kadoma
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Kadoma
- Agency: WHDA, LLP
- Priority: JPJP2017-220910 20171116
- International Application: PCT/JP2018/032357 WO 20180831
- International Announcement: WO2019/097813 WO 20190523
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L29/778 ; H01L29/78

Abstract:
A nitride semiconductor device includes a substrate; a first nitride semiconductor layer above the substrate; a block layer above the first nitride semiconductor layer; a first opening penetrating through the block layer; an electron transit layer and an electron supply layer provided sequentially above the block layer and along an inner surface of the first opening; a gate electrode provided above the electron supply layer to cover the first opening; a second opening penetrating through the electron supply layer and the electron transit layer; a source electrode provided in the second opening; and a drain electrode. When the first main surface is seen in a plan view, (i) the first opening and the source electrode each are elongated in a predetermined direction, and (ii) at least part of an outline of a first end of the first opening in a longitudinal direction follows an arc or an elliptical arc.
Public/Granted literature
- US20200312964A1 NITRIDE SEMICONDUCTOR DEVICE Public/Granted day:2020-10-01
Information query
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