Invention Grant
- Patent Title: Schottky barrier diode
-
Application No.: US17282629Application Date: 2019-10-09
-
Publication No.: US11621357B2Publication Date: 2023-04-04
- Inventor: Jun Arima , Minoru Fujita , Jun Hirabayashi , Kohei Sasaki
- Applicant: TDK Corporation , TAMURA CORPORATION , Novel Crystal Technology, Inc.
- Applicant Address: JP Tokyo; JP Tokyo; JP Saitama
- Assignee: TDK Corporation,TAMURA CORPORATION,Novel Crystal Technology, Inc.
- Current Assignee: TDK Corporation,TAMURA CORPORATION,Novel Crystal Technology, Inc.
- Current Assignee Address: JP Tokyo; JP Tokyo; JP Saitama
- Agency: McDermott Will & Emery LLP
- Priority: JPJP2018-199203 20181023
- International Application: PCT/JP2019/039854 WO 20191009
- International Announcement: WO2020/085095 WO 20200430
- Main IPC: H01L29/24
- IPC: H01L29/24 ; H01L29/872 ; H01L29/41 ; H01L29/47

Abstract:
An object of the present invention is to provide a Schottky barrier diode less liable to cause dielectric breakdown due to concentration of an electric field. A Schottky barrier diode according to this disclosure includes a semiconductor substrate made of gallium oxide, a drift layer made of gallium oxide and provided on the semiconductor substrate, an anode electrode 40 brought into Schottky contact with the drift layer, a cathode electrode brought into ohmic contact with the semiconductor substrate, an insulating layer provided on the drift layer so as to surround the anode electrode in a plan view, and a semiconductor layer provided on a surface of a part of the drift layer that is positioned between the anode electrode and the insulating layer and on the insulating layer. The semiconductor layer has a conductivity type opposite to that of the drift layer.
Public/Granted literature
- US20210343880A1 SCHOTTKY BARRIER DIODE Public/Granted day:2021-11-04
Information query
IPC分类: