Invention Grant
- Patent Title: Flip-chip of light emitting diode and manufacturing method and illuminating method thereof
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Application No.: US16626517Application Date: 2018-07-31
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Publication No.: US11621380B2Publication Date: 2023-04-04
- Inventor: Xingen Wu , Yingce Liu , Junxian Li , Qilong Wu
- Applicant: XIAMEN CHANGELIGHT CO., LTD.
- Applicant Address: CN Fujian
- Assignee: XIAMEN CHANGELIGHT CO., LTD.
- Current Assignee: XIAMEN CHANGELIGHT CO., LTD.
- Current Assignee Address: CN Fujian
- Agency: Arch & Lake LLP
- Priority: CN201810382603.0 20180426,CN201820604683.5 20180426
- International Application: PCT/CN2018/097778 WO 20180731
- International Announcement: WO2019/205328 WO 20191031
- Main IPC: H01L33/60
- IPC: H01L33/60 ; H01L27/15 ; H01L33/36 ; H01L33/62

Abstract:
A flip-chip of light emitting diode includes at least one reflective layer, at least one N-type electrode, at least one P-type electrode, at least one distributed Bragg reflector, and an epitaxial unit. The epitaxial unit includes a substrate, an N-type layer, an active layer, and a P-type layer, wherein the substrate, the N-type layer, the active layer, and the P-type are sequentially stacked. The epitaxial unit has at least one N-type layer exposed portion, which is extended from the outer side surface of the P-type layer to the N-type layer via the active layer. The at least one reflective layer is formed on the P-type layer, wherein the at least one distributed Bragg reflector is integrally bonded to the N-type layer, the active layer, the P-type layer, and the at least one reflective layer. The at least one N-type electrode is electrically connected with the N-type layer and the at least one P-type electrode is electrically connected with the P-type layer.
Public/Granted literature
- US20200251632A1 Flip-Chip of Light Emitting Diode and Manufacturing Method and Illuminating Method Thereof Public/Granted day:2020-08-06
Information query
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