Invention Grant
- Patent Title: Magnetoresistance effect element including a crystallized co heusler alloy layer
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Application No.: US17480599Application Date: 2021-09-21
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Publication No.: US11621392B2Publication Date: 2023-04-04
- Inventor: Shinto Ichikawa , Kazuumi Inubushi , Katsuyuki Nakada
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2019-232751 20191224,JPJP2020-207759 20201215
- Main IPC: G01R33/09
- IPC: G01R33/09 ; G11B5/39 ; H01L43/08 ; H01L43/04 ; G11C11/16 ; H01L43/10

Abstract:
A magnetoresistance effect element includes: a first ferromagnetic layer; a second ferromagnetic layer; and a non-magnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer, wherein at least one of the first ferromagnetic layer and the second ferromagnetic layer includes a first layer and a second layer in order from the side closer to the non-magnetic layer, the first layer contains a crystallized Co-based Heusler alloy, at least a part of the second layer is crystallized, the second layer contains a ferromagnetic element, boron element and an additive element, and the additive element is any element selected from a group consisting of Ti, V, Cr, Cu, Zn, Zr, Mo, Ru, Pd, Ta, W, Ir, Pt, and Au.
Public/Granted literature
- US20220006007A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2022-01-06
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