Invention Grant
- Patent Title: Polishing head with membrane position control
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Application No.: US16706489Application Date: 2019-12-06
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Publication No.: US11623320B2Publication Date: 2023-04-11
- Inventor: Steven M. Zungia , Jay Gurusamy
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B37/005
- IPC: B24B37/005 ; B24B37/32
Abstract:
A carrier head for chemical mechanical polishing includes a housing for attachment to a drive shaft, a membrane assembly beneath the housing with a space between the housing and the membrane assembly defining a pressurizable chamber, and a sensor in the housing configured to measure a distance from the sensor to the membrane assembly.
Public/Granted literature
- US20210053178A1 Polishing Head with Membrane Position Control Public/Granted day:2021-02-25
Information query
