Invention Grant
- Patent Title: Fan-out structure and method of fabricating the same
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Application No.: US17194721Application Date: 2021-03-08
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Publication No.: US11626296B2Publication Date: 2023-04-11
- Inventor: Chen-Hua Yu , An-Jhih Su , Chi-Hsi Wu , Der-Chyang Yeh , Hsien-Wei Chen , Wei-Yu Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/56
- IPC: H01L21/56 ; H01L23/00 ; H01L23/495 ; H01L25/18 ; H01L21/683 ; H01L23/498 ; H01L25/10 ; H01L23/538 ; H01L23/31 ; H01L21/48

Abstract:
A semiconductor device includes a first die extending through a molding compound layer, a first dummy die having a bottom embedded in the molding compound layer, wherein a height of the first die is greater than a height of the first dummy die, and an interconnect structure over the molding compound layer, wherein a first metal feature of the interconnect structure is electrically connected to the first die and a second metal feature of the interconnect structure is over the first dummy die and extends over a sidewall of the first dummy die.
Public/Granted literature
- US20210193485A1 Fan-Out Structure and Method of Fabricating the Same Public/Granted day:2021-06-24
Information query
IPC分类: