Invention Grant
- Patent Title: Display device including transistor with separate insulating patterns and etch stoppers overlying active layer thereof, and method of manufacturing the same
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Application No.: US17307881Application Date: 2021-05-04
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Publication No.: US11626471B2Publication Date: 2023-04-11
- Inventor: Youngseok Baek , Sangjin Park , Chongsup Chang , Eui Kang Heo
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2020-0117914 20200914
- Main IPC: H01L27/32
- IPC: H01L27/32 ; H01L51/56 ; H01L51/52

Abstract:
A display device includes: a first active pattern on a light blocking pattern; a second active pattern at a same layer as that of the first active pattern; a first insulating pattern on the first active pattern; a second insulating pattern on the first active pattern, the second insulating pattern being spaced from the first insulating pattern, and having a first contact hole exposing the first active pattern; a first gate electrode on the first insulating pattern; a second gate electrode at a same layer as that of the first gate electrode, and overlapping with the second active pattern; a first etch stopper on the second insulating pattern, and having a second contact hole connected to the first contact hole; and a first electrode on the first etch stopper, the first electrode contacting the light blocking pattern and the first active pattern through the first and second contact holes.
Public/Granted literature
- US20220085131A1 DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-03-17
Information query
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