Invention Grant
- Patent Title: Semiconductor light emitting device and method for manufacturing semiconductor light emitting device
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Application No.: US17583690Application Date: 2022-01-25
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Publication No.: US11626539B2Publication Date: 2023-04-11
- Inventor: Yohei Ito
- Applicant: ROHM CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: ROHM CO., LTD.
- Current Assignee: ROHM CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Rabin & Berdo, P.C.
- Priority: JPJP2018-193531 20181012,JPJP2019-131237 20190716
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L33/38 ; H01L33/30 ; H01L33/00 ; H01L33/62

Abstract:
Method for manufacturing semiconductor light-emitting device having a substrate, a metal layer over the substrate, and a semiconductor layer over the metal layer. The semiconductor layer includes a light-emitting layer, and with respect to the light-emitting layer, a first conductivity type layer at a substrate side and a second conductivity type layer opposite the substrate. The second conductivity type layer includes a first layer forming a semiconductor layer surface and a second layer at the substrate side with respect to the first layer. The method includes exposing a second layer surface by selectively removing the first layer, forming an uneven surface portion of the second layer by frost processing the exposed surface, forming an electrode over the first layer, forming a space between an end portion of the first layer and a peripheral edge of the electrode by side-etching the first layer toward a lower side of the electrode using a nitric acid-based dilute solution, and forming another electrode below the substrate.
Public/Granted literature
- US20220149242A1 SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2022-05-12
Information query
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