Invention Grant
- Patent Title: Method for regulating inert gas flow, method for preparing monocrystalline silicon, and monocrystalline silicon
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Application No.: US16912885Application Date: 2020-06-26
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Publication No.: US11629985B2Publication Date: 2023-04-18
- Inventor: Hao Pan , Hyunguk Jeon
- Applicant: XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD. , XI'AN ESWIN SILICON WAFER TECHNOLOGY CO., LTD.
- Applicant Address: CN Xi'an; CN Xi'an
- Assignee: XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD.,XI'AN ESWIN SILICON WAFER TECHNOLOGY CO., LTD.
- Current Assignee: XI'AN ESWIN MATERIAL TECHNOLOGY CO., LTD.,XI'AN ESWIN SILICON WAFER TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Xi'an; CN Xi'an
- Agency: Maginot, Moore & Beck LLP
- Priority: CN201910561681.1 20190626
- Main IPC: C30B15/00
- IPC: C30B15/00 ; G01F3/22 ; F26B21/00 ; C30B27/02 ; C30B29/06 ; F26B21/02

Abstract:
The present disclosure provides a method for regulating an inert gas flow in a crystal pulling furnace, a method for preparing monocrystalline silicon, and monocrystalline silicon. The method for regulating an inert gas flow includes introducing the inert gas into a main furnace chamber of the crystal pulling furnace from an auxiliary furnace chamber of the crystal pulling furnace, and regulating a flow direction of the inert gas flow introduced into the auxiliary furnace chamber of the crystal pulling furnace.
Information query
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