Invention Grant
- Patent Title: Load port device, gas gate and gas-providing method
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Application No.: US16932444Application Date: 2020-07-17
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Publication No.: US11631604B2Publication Date: 2023-04-18
- Inventor: Jih-Cheng Huang , Sun-Fu Chou
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L21/673
- IPC: H01L21/673 ; H01L21/67
Abstract:
The present disclosure provides a load port device, a gas gate and a gas-providing method. The load port device includes a gas-providing nozzle and the gas gate. The gas-providing nozzle is used for providing gas to a wafer container. The gas gate includes a plurality of gas inlet ports, a gas-providing port and a controller. Each gas inlet port connects to a gas source. The gas-providing port connects to the gas-providing nozzle. The controller is configured to: select one of the plurality of gas inlet ports; and connect the selected gas inlet port to the gas-providing port.
Public/Granted literature
- US20220020620A1 LOAD PORT DEVICE, GAS GATE AND GAS-PROVIDING METHOD Public/Granted day:2022-01-20
Information query
IPC分类:
