Invention Grant
- Patent Title: Group-III nitride laminated substrate and semiconductor light-emitting element
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Application No.: US16952699Application Date: 2020-11-19
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Publication No.: US11631785B2Publication Date: 2023-04-18
- Inventor: Hajime Fujikura , Taichiro Konno , Takeshi Kimura
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2019-211371 20191122
- Main IPC: H01L33/32
- IPC: H01L33/32 ; H01L33/00 ; C30B29/40

Abstract:
A group III-nitride laminated substrate includes a sapphire substrate, a first layer that is formed on the sapphire substrate and is made of aluminum nitride, a second layer that is formed on the first layer and serves as an n-type layer made of gallium nitride and doped with an n-type dopant, a third layer that is formed on the second layer and serves as a light-emitting layer made of a group III-nitride, and a fourth layer that is formed on the third layer and serves as a p-type layer made of a group III-nitride and doped with a p-type dopant. The second layer has a thickness of 7 μm or less. A half-value width of (0002) diffraction determined through X-ray rocking curve analysis is 100 seconds or less, and a half-value width of (10-12) diffraction determined through X-ray rocking curve analysis is 200 seconds or less.
Public/Granted literature
- US20210217927A1 GROUP-III NITRIDE LAMINATED SUBSTRATE AND SEMICONDUCTOR LIGHT-EMITTING ELEMENT Public/Granted day:2021-07-15
Information query
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