Invention Grant
- Patent Title: Deposition mask and methods of manufacturing and using a deposition mask
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Application No.: US16806511Application Date: 2020-03-02
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Publication No.: US11631813B2Publication Date: 2023-04-18
- Inventor: Kevin Moraes , Alexander N. Lerner
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C14/04 ; C23C14/02 ; C23C14/12 ; H01L51/42

Abstract:
Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of the substrate is removed to define a substrate opening through a periphery portion of the substrate. The mask layer with the mask openings through the mask layer extending across the substrate opening.
Public/Granted literature
- US20200295265A1 DEPOSITION MASK AND METHODS OF MANUFACTURING AND USING A DEPOSITION MASK Public/Granted day:2020-09-17
Information query
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