Invention Grant
- Patent Title: Method and apparatus for interference measurement
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Application No.: US17248771Application Date: 2021-02-05
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Publication No.: US11632157B2Publication Date: 2023-04-18
- Inventor: Eko Onggosanusi , Md. Saifur Rahman , Emad N. Farag
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Main IPC: H04L5/00
- IPC: H04L5/00 ; H04B7/06 ; H04B17/336 ; H04W24/10

Abstract:
Methods and apparatuses for interference measurement. A method for operating a user equipment (UE) includes receiving configuration information on at least three reference signal (RS) resources. Two of the at least three RS resources correspond to channel state information interference measurement (CSI-IM) resources. The method further includes measuring interference based on the CSI-IM resources, calculate a beam metric based on the measured interference, and transmitting the beam metric.
Public/Granted literature
- US20210258059A1 METHOD AND APPARATUS FOR INTERFERENCE MEASUREMENT Public/Granted day:2021-08-19
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