Invention Grant
- Patent Title: Apparatus for manufacturing polysilicon rod
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Application No.: US17345571Application Date: 2021-06-11
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Publication No.: US11639293B2Publication Date: 2023-05-02
- Inventor: Tetsuro Okada , Naruhiro Hoshino , Masahiko Ishida
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Ladas & Parry, LLP
- Priority: JPJP2020-114568 20200702
- Main IPC: C23C16/24
- IPC: C23C16/24 ; C01B33/035 ; C23C16/458 ; C23C16/46

Abstract:
An apparatus for manufacturing polysilicon rod by a Siemens method has a base plate 20; and a holding body 100 provided on the base plate 20 so as to be movable in a horizontal direction and electrically connect between a core wire holder 1 and an electrode 4. The holding body 100 is configured to rotatably hold the core wire holder 1 with respect to the base plate 20.
Public/Granted literature
- US11673809B2 Apparatus for manufacturing polysilicon rod Public/Granted day:2023-06-13
Information query
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