Invention Grant
- Patent Title: Precision alignment system for millimeter wave sources
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Application No.: US17530042Application Date: 2021-11-18
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Publication No.: US11640893B1Publication Date: 2023-05-02
- Inventor: Philipp Borchard , Joseph S. Hoh
- Applicant: Dymenso LLC
- Applicant Address: US CA San Francisco
- Assignee: Dymenso LLC
- Current Assignee: Dymenso LLC
- Current Assignee Address: US CA San Francisco
- Agency: Lumen Patent Firm
- Main IPC: H01J29/04
- IPC: H01J29/04 ; H01J29/54 ; H01J29/66

Abstract:
A high-power vacuum electron device source of 10 mm-0.1 mm wavelength radiation is composed of an electron gun joined to a RF vacuum electronic circuit. The electron gun includes a cathode, a focus electrode, and a grid. It generates an electron beam that is injected into the circuit for amplifying RF waves. The circuit is composed of metal circuit plates, e.g., copper alloy, that mate with each other and are shaped to provide a beam tunnel and RF circuit envelopes. Precision alignment pins made of nickel super alloy, are used to mutually align the metal circuit plates using elastic averaging implemented by positioning the precision alignment pins in precision alignment holes in the metal circuit plates. Preferably, the electron gun is aligned with the circuit using quasi-kinematic coupling.
Public/Granted literature
- US20230154717A1 Precision Alignment System for Millimeter Wave Sources Public/Granted day:2023-05-18
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