Invention Grant
- Patent Title: Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS)
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Application No.: US17162828Application Date: 2021-01-29
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Publication No.: US11640900B2Publication Date: 2023-05-02
- Inventor: Birol Kuyel
- Applicant: Nano-Master, Inc.
- Applicant Address: US TX Austin
- Assignee: Nano-Master, Inc.
- Current Assignee: Nano-Master, Inc.
- Current Assignee Address: US TX Austin
- Agent Asif Ghias
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
Techniques are disclosed for an electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS). A cylindrical magnet is placed around the neck of a hollow cathode under the influence of an RF field. A plasma gas is introduced in the hollow cathode that undergoes phase transition to a plasma containing free electrons and gas ions. The magnetic field of the magnet causes ECR that confines free electrons to a narrow spiraling beam traveling down the body of the hollow cathode. Unlike traditional methods, the present ECR-enhanced design confines the electrons and ions to a narrow path away from the walls of the cathode. The high-density, stable plasma is available at the distal end of the hollow cathode. A multicavity design utilizes multiple cavities with multiple aligned magnets in a single reactor suitable for various processes including, PECVD, PEALD, ALE, etc.
Public/Granted literature
- US20210249234A1 Electron Cyclotron Rotation (ECR)-Enhanced Hollow Cathode Plasma Source (HCPS) Public/Granted day:2021-08-12
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