• Patent Title: Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS)
  • Application No.: US17162828
    Application Date: 2021-01-29
  • Publication No.: US11640900B2
    Publication Date: 2023-05-02
  • Inventor: Birol Kuyel
  • Applicant: Nano-Master, Inc.
  • Applicant Address: US TX Austin
  • Assignee: Nano-Master, Inc.
  • Current Assignee: Nano-Master, Inc.
  • Current Assignee Address: US TX Austin
  • Agent Asif Ghias
  • Main IPC: H01J37/32
  • IPC: H01J37/32
Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS)
Abstract:
Techniques are disclosed for an electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS). A cylindrical magnet is placed around the neck of a hollow cathode under the influence of an RF field. A plasma gas is introduced in the hollow cathode that undergoes phase transition to a plasma containing free electrons and gas ions. The magnetic field of the magnet causes ECR that confines free electrons to a narrow spiraling beam traveling down the body of the hollow cathode. Unlike traditional methods, the present ECR-enhanced design confines the electrons and ions to a narrow path away from the walls of the cathode. The high-density, stable plasma is available at the distal end of the hollow cathode. A multicavity design utilizes multiple cavities with multiple aligned magnets in a single reactor suitable for various processes including, PECVD, PEALD, ALE, etc.
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