Invention Grant
- Patent Title: Method of manufacturing semiconductor device
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Application No.: US17454042Application Date: 2021-11-08
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Publication No.: US11641733B2Publication Date: 2023-05-02
- Inventor: Chia-Lin Chang
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: CKC & Partners Co., LLC
- Main IPC: H10B12/00
- IPC: H10B12/00 ; H01L21/311 ; H01L29/78 ; H01L23/528 ; H01L49/02

Abstract:
A semiconductor includes a semiconductor substrate and pillar type capacitors. The semiconductor substrate includes first connecting pads and second connecting pads. The second connecting pads are disposed on the first connecting pads respectively, and the pillar type capacitors are disposed on the second connecting pads respectively. A first ends of the pillar type capacitors are connected to the second connecting pads respectively, and a second ends of the pillar type capacitors area at the opposite side of the first ends. The distance between the first end and the second end of each of the pillar type capacitors is from 1 micrometer to 1.8 micrometer. A manufacturing method is also provided.
Public/Granted literature
- US20220059541A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2022-02-24
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