Invention Grant
- Patent Title: Black matrix and method for manufacturing the same, and color filter substrate and method for manufacturing the same
-
Application No.: US17203018Application Date: 2021-03-16
-
Publication No.: US11641761B2Publication Date: 2023-05-02
- Inventor: Jian Li
- Applicant: BEIJING XIAOMI MOBILE SOFTWARE CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BEIJING XIAOMI MOBILE SOFTWARE CO., LTD.
- Current Assignee: BEIJING XIAOMI MOBILE SOFTWARE CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Cozen O'Connor
- Priority: CN202010762361.5 20200731
- Main IPC: G02F1/1335
- IPC: G02F1/1335

Abstract:
The present disclosure provides a black matrix and a method for manufacturing the same, and a color filter substrate and a method for manufacturing the same. The method for manufacturing the black matrix includes: providing a substrate; forming a sacrificial layer on the substrate, the sacrificial layer including a plurality of sacrificial patterns; forming a light shielding film layer on the sacrificial layer, wherein the light shielding film layer includes a plurality of first light shielding patterns and a plurality of second light shielding patterns, and each of the second light shielding patterns and an adjacent first light shielding pattern are separated by the sacrificial pattern; removing the sacrificial layer and the second light shielding pattern and forming the black matrix.
Public/Granted literature
Information query
IPC分类: