- Patent Title: High purity 2-naphthylacetonitrile and method for producing same
-
Application No.: US17295222Application Date: 2020-10-28
-
Publication No.: US11643386B2Publication Date: 2023-05-09
- Inventor: Masaki Nagahama , Daiki Okado , Hirotsugu Taniike
- Applicant: API CORPORATION
- Applicant Address: JP Chiyoda-ku
- Assignee: API CORPORATION
- Current Assignee: API CORPORATION
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 2019196782 2019.10.29
- International Application: PCT/JP2020/040413 2020.10.28
- International Announcement: WO2021/085468A 2021.05.06
- Date entered country: 2021-05-19
- Main IPC: C07C253/22
- IPC: C07C253/22

Abstract:
High purity 2-naphthylacetonitrile with fewer impurities can be used as a starting material or intermediate for synthesizing various pharmaceutical products, agricultural chemicals, and chemical products, and a production method thereof. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, and containing naphthalene compounds represented by the formulas (a)-(j) at a content of a predetermined area % or below. A method for producing high purity 2-naphthylacetonitrile, may include: subjecting 2′-acetonaphthone to a Willgerodt reaction in the presence of an additive where necessary, and hydrolyzing the obtained amide compound to give 2-naphthylacetic acid; and reacting the 2-naphthylacetic acid obtained in the subjecting, a halogenating agent and sulfamide in the presence of a catalyst as necessary in an organic solvent to give 2-naphthylacetonitrile.
Public/Granted literature
- US20220009880A1 HIGH PURITY 2-NAPHTHYLACETONITRILE AND METHOD FOR PRODUCING SAME Public/Granted day:2022-01-13
Information query