Invention Grant
- Patent Title: Far-infrared light source and far-infrared spectrometer
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Application No.: US17409122Application Date: 2021-08-23
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Publication No.: US11644418B2Publication Date: 2023-05-09
- Inventor: Kei Shimura , Mizuki Mohara , Kenji Aiko
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Main IPC: G01N21/3581
- IPC: G01N21/3581

Abstract:
The present invention provides a far-infrared light source capable of reducing the shift in the location irradiated with far-infrared light even when the frequency of the far-infrared light changes. A far-infrared light source according to the present invention is configured so that the variation in the emission angle of far-infrared light in a nonlinear optical crystal when the frequency of the far-infrared light changes is substantially offset by the variation in the refractive angle of the far-infrared light at the interface between the nonlinear optical crystal and a prism when the frequency of the far-infrared light changes (see FIG. 8).
Public/Granted literature
- US20210381965A1 Far-Infrared Light Source and Far-Infrared Spectrometer Public/Granted day:2021-12-09
Information query
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